[Crystal Research and Technology] Analysis of Influencing Factors on Silicon Epitaxial Growth in Horizontal Single-Wafer Reactor through Orthogonal Test

80. Li, Chaozhong, Chengshuai Li, Hang Jiang, Hao Chen, and Haisheng Fang, Analysis of Influencing Factors on Silicon Epitaxial Growth in Horizontal Single-Wafer Reactor through Orthogonal Test, Crystal Research and Technology, 2300237 (2024), 1–11

https://doi.org/10.1002/crat.202300237