[Surface and Coatings Technology] Copper Target Erosion during Unbalanced Magnetron Sputtering under Different Electromagnetic Fields

79. An, Qiaoru, Jie Li, and Haisheng Fang, Copper Target Erosion during Unbalanced Magnetron Sputtering under Different Electromagnetic Fields, Surface and Coatings Technology, 477.December (2023), 130360

https://doi.org/10.1016/j.surfcoat.2023.130360