[Applied Surface Science] Monte Carlo simulation of deposition uniformity in the triple-target magnetron co-sputtering system

2023年12月07日 15:58  点击:[]


77. J. Li, Q. An, H. Fang. Monte Carlo simulation of deposition uniformity in the triple-target magnetron co-sputtering system. Applied Surface Science. Elsevier B.V., 2024, 646(November 2023): 158914

https://doi.org/10.1016/j.apsusc.2023.158914


上一条:[International Journal of Applied Glass Science] Modeling and Optimization of the Sagging Process for Large-Size and High-Purity Silica Glass Synthesis 下一条:[Ceramics International] SiO2 soot preform sintering process for the synthesis of large-size and high-purity silica glass

关闭

Top