Systematic Study of Epitaxy Growth Uniformity in a Specific MOCVD Reactor

2017年09月26日 08:47  点击:[]

25. Haisheng Fang, Zhi Zhang, Yaoyu Pan, Ronghui Ma*, Mengying Wang, Systematic Study of Epitaxy Growth Uniformity in a Specific MOCVD Reactor, Cryst. Res. Technol. 49, No. 11, 907–918 (2014).

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